The chair for microsystems technology is currently pursuing four focal points, which largely overlap, particularly in terms of the technology base. A dedicated clean room is available for this purpose, which was built in 2010 and fundamentally revised in 2017 - 2019 due to significant structural defects and upgraded for the processing of wafers up to 200 mm. In addition, devices in the center for interface-dominated high-performance materials are looked after and used, in particular the systems available there for plasma-based etching, and there is an active cooperation with the IMN MacroNano® and ZMN of the TU Ilmenau.
"IMAGINATION IS MORE IMPORTANT THAN KNOWLEDGE, BECAUSE KNOWLEDGE IS LIMITED. BUT IMAGINATION INCLUDES THE WHOLE WORLD."
The chair for microsystem technology has facilities for the preparation of semiconductor micro- and nanostructures. Another highlight at RUB is the clean room wing in the ID building, which was completed in 2020.