The chair for microsystems technology is currently pursuing four focal points, which largely overlap, particularly in terms of the technology base. A dedicated clean room is available for this purpose, which was built in 2010 and fundamentally revised in 2017 - 2019 due to significant structural defects and upgraded for the processing of wafers up to 200 mm. In addition, devices in the center for interface-dominated high-performance materials are looked after and used, in particular the systems available there for plasma-based etching, and there is an active cooperation with the IMN MacroNano® and ZMN of the TU Ilmenau.
"IMAGINATION IS MORE IMPORTANT THAN KNOWLEDGE, BECAUSE KNOWLEDGE IS LIMITED. BUT IMAGINATION INCLUDES THE WHOLE WORLD."
ALBERT EINSTEIN
In the project, an innovative, monolayer-precise deposition and etching technology at low temperatures for the production of cost-effective, flexible microelectronics and ultra-sensitive microsensors is being developed and implemented in a 200 mm cluster system on substrates.
Administration
Room: ID 05/441
Phone: (+49) (0) 234 32 - 22183
Fax: (+49) (0) 234 32 - 14166
Email: sekretariat-mst@rub.de
Lageplan & Anreiseinformationen der RUB
Prof. Dr.-Ing. Martin Hoffmann
Room: ID 05/439
Phone: (+49) (0) 234 32 - 27700
Fax: (+49) (0) 234 32 - 14166
Email: martin.hoffmann-mst@rub.de