Our clean rooms

The chair for microsystems technology has facilities for the preparation of semiconductor micro- and nanostructures.
These include, among others:

Oxidizing ovens
Plasma incinerator
Spin coater
Laser lithography system  (structure widths > 600 nm)
Scanning electron miscroscope / electron beam lithography system
Inert gas glove box with spin coater and Ozone Cleaner
Plasma etching machine (ICP-RIE)    
Evaporation systems
Wafer saws
Plasma coating system (ICPECVD)
Tempering systems
Scoring device

During the preparation, the components and systems are characterized with the following devices:

  •   optical miscroscopes
  •   Ellipsometer
  •   Interference microscope
  •   Confocal microscope
  •   Scanning probe microscopes (AFM, MFM)

Several cryostats (temperature range: 300 mK to 500 K) and electromagnets and superconducting magnets (up to 17 T) are available for magnetic field-dependent and temperature-dependent measurements. The electrical characterization is carried out using semiconductor parameter analyzers, lock-in technology (up to f = 200 MHz) and capacitance-voltage measuring devices.

Postal Address

Ruhr-University Bo­chum
Fa­culty of Electrical Engineering
and Information Technology
Microsystems Technology
Postbox ID 7
Uni­ver­si­täts­stra­ße 150
D-44801 Bo­chum



Room: ID 05/441
Phone: (+49) (0) 234 32 - 22183 
Fax: (+49) (0) 234 32 - 14166    
Email: sekretariat-mst(at)​        
La­ge­plan & An­rei­se­infor­ma­tio­nen der RUB                                                                            


Chair Holder

Prof. Dr.-Ing. Mar­tin Hoff­mann 
Room: ID 05/439 
Phone: (+49) (0) 234 32 - 27700
Fax: (+49) (0) 234 32 - 14166
Email: martin.​hoffmann-mst(at)​


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