Research

The chair for microsystems technology is currently pursuing four focal points, which largely overlap, particularly in terms of the technology base. A dedicated clean room is available for this purpose, which was built in 2010 and fundamentally revised in 2017 - 2019 due to significant structural defects and upgraded for the processing of wafers up to 200 mm. In addition, devices in the center for interface-dominated high-performance materials are looked after and used, in particular the systems available there for plasma-based etching, and there is an active cooperation with the IMN MacroNano^® and ZMN of the TU Ilmenau.

"IMAGINATION IS MORE IMPORTANT THAN KNOWLEDGE, BECAUSE KNOWLEDGE IS LIMITED. BUT IMAGINATION INCLUDES THE WHOLE WORLD."
ALBERT EINSTEIN

Projects

Publications

Cooperations

Microactuators

Complex micro-actuator system concepts are researched mainly on the basis of the "silicon-on-insulator" technology (SOI). The focus is on electrostatic principles and also include fluidic systems that move drops by means of dielectric effects.

Two-dimensional material systems for electronics and sensors

2D materials are a relatively young class of materials that consist of very thin, ideally monolayer, but still crystalline layers. A special feature is that different layers can be combined here even if their crystal lattices are not adapted.

Optical microsystems

Optical microsystems form a continuous focus of research activities. Starting with waveguide systems for sensors and optical communication technology to emitters and absorbers for long-wave infrared technology.

Energy self-sufficient microsensors

Our approach aims to do without electrical auxiliary energy for amplification, storage and AD conversion.

Micro-nano integration

This topic forms one of the long-term, overarching focal points of our own research. It is becoming apparent that, within the framework of the More-than-Moore strategy, the integration of post-CMOS nanostructures on microelectronic wafers will play a key role.

ForLab

In the project, an innovative, monolayer-precise deposition and etching technology at low temperatures for the production of cost-effective, flexible microelectronics and ultra-sensitive microsensors is being developed and implemented in a 200 mm cluster system on substrates.

Equipment

The chair for microsystems technology has facilities for the preparation of semiconductor micro- and nanostructures. Another highlight at RUB is the clean room wing in the ID building, which was completed in 2020.

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